Design a heterojunction photodiode to detect from 0.8 to 1.8 microns to be used for optical communications. Suggest processing techniques beginning with an appropriate substrate:
-Select a substrate and describe the substrate preparation steps
-Describe how you will characterize your substrate to determine that your preparation facilitates epitaxial growth
-select material systems for this application (including metal contacts). Demonstarate how you considered optical dampening and absorption
-show your growth rate calculation
– Describe the in-situ characterization method that you will use to monitor the crystalline quality of the growth film
-Draw the equilibrium and biased energy band diagram

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